Effect of atmosphere in atmospheric pressure plasma annealing on the formation of CuFeO2 thin films
碩士 === 國立高雄應用科技大學 === 化學工程與材料工程系博碩士班 === 106 === In this study, delafossite CuFeO2 thin films were deposited onto a quartz substrate with a sol-gel process and then specimens were annealed using an atmospheric pressure plasma between 550 ℃ and 750 ℃ with N2-0%O2 to N2-10%O2. Single delafossite-CuFeO...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/4zgskh |