An Anti-reflection Film Required for the Mask in Deep Ultraviolet Region by Electron Gun
碩士 === 中華科技大學 === 機電光工程研究所碩士班 === 106 === Nowadays, with the increasing demand for optical resolution in technology, the usage of short and very short wavelength lasers becomes indispensable. However, the usage of short-wavelength lasers (or deep ultraviolet) brings with it new problematics: In the...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/btn6b9 |