| Summary: | 碩士 === 國立臺北科技大學 === 機電整合研究所 === 105 === The main purpose of this thesis is to increase the adhesion of diamond film to increase the wear resistance and service life of the diamond film. However, this study uses the self-made hot filament chemical vapor deposition system for the preparation of diamond composite film, The first part is to change the substrate temperature to grow diamond film to explore, and change the methane concentration to explore the impact of growth of diamond film. By virtue of this master microcrystalline diamond and nanocrystalline diamond film optimization parameters, and then control the process parameters to prepare micro-nanocrystalline diamond composite film. In the second part, the influence of the concentration of etching solution on the growth of diamond film of tungsten carbide substrate and the effect of silicon carbide intermediate layer method on the growth of diamond film of tungsten carbide substrate were studied. And the film adhesion degree of the test to get the best diamond composite membrane structure parameters. In this study, it was found that the peak value of the sp3 diamond bond was 1332cm-1 when the substrate temperature was 700 ° C, which confirmed that the quality of the diamond film was relatively good. Where the methane concentration is 2% the best parameter for the micron crystal diamond, the methane concentration is 4% is the best parameter for the nanocrystalline diamond; also when the diamond film is the composite structure(MCD / NCD),(NCD / MCD) get the better film adhesion, The optimum parameters of the boundary layer are silicon power 175 W, working pressure 5 mTorr, deposition time 5 h, and the result of Rockwell hardness indentation test results in good diamond film integrity, confirmed by the results of this study , The preparation of diamond composite membrane structure in the tungsten carbide material, in the processing industry in the application of great potential.
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