The study of electrochromic device using WO3/Ag/WO3 transparent conductive thin films fabricated by magnetron sputtering

• Main Authors: Jun-Yu Huang, 黃峻俞
• Other Authors: 陳適範
• Format: Others
• Language: zh-TW
• Published: 2017
• Online Access: http://ndltd.ncl.edu.tw/handle/bau3sp

碩士 === 國立臺北科技大學 === 材料科學與工程研究所 === 105 === The WO3/Ag/WO3 transparent conductive thin films were deposited on glass substrates by RF magnetron sputtering. At fixed working pressure and sputtering power, the effects of various film thickness on the optical, electrical, and electrochromic properties of films were investigated. The as-deposited films characterizations were analyzed with XRD, FE-SEM, UV/VIS spectrometry, four point probe measurement, potentiostat and α-step. The experimental results show that the increase of the silver thickness in the WAW structure will increase its conductivity, but the transmittance at visible region will decrease significantly. The optimized structure for WAW was obtained to be WO3(50 nm)/Ag (10 nm)/WO3(50 nm) with the transmittance of 81.34% and the sheet resistance of 10.68 ?/sq, with the optimum FOM of 11.87×10-3 Ω-1. The tungsten oxide films which were deposited with high O2/Ar ratio showed a high optical density. Using RF sputtering power of 100 W, O2/Ar ratio is 0.8, the tungsten oxide film has the maximum transmittance variation of 56.6% at the visible wavelength of 550 nm, and the coloring efficiency (CE) of the film is 34.6 cm2/C. The thin film exhibits a long-term cycling stability of 1500 cycles.