| Summary: | 碩士 === 南臺科技大學 === 光電工程系 === 105 === We mainly study on the difference of the reflective index of distributed Bragg reflector structure under different material in this paper. And we discussed the thing that brings about the the effect of reflectivity.
We deposited the ZnO films on glass by the RF magnetron sputtering, and then we can find out the best experimental parameters by discussing the influence of ZnO films on RF power, Ar flow, and the working pressure. According to the experiment, we can get the best crystallinity of ZnO films under the RF power of 125W. Ar flow and process pressure are 7sccm and 15mtorr respectively. So we use the RF power of 125W, Ar flow of 7sccm, and process pressure of 15mtorr to be our best experimental parameters in this experiment.
And we determined the thickness and the reflective index of the ZnO films using Spectroscopic ellipsometry. By calculation, we can get the thickness of ZnO, MgO, and TiO2 of distributed Bragg reflector structure. We used this thickness to prepare the distributed Bragg reflector structure. We will have two kinds of the experimental groups. One of the experimental groups is ZnO/MgO. The other one is ZnO/TiO2. We will study on the difference of the reflective index.
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