Analysis of Specific Resistance of Vanadium and Vanadium Oxide

• Main Authors: Yi-Yu Tsai, 蔡翊佑
• Other Authors: 陳文瑞
• Format: Others
• Language: zh-TW
• Published: 2017
• Online Access: http://ndltd.ncl.edu.tw/handle/j9rh23

碩士 === 國立虎尾科技大學 === 光電工程系光電與材料科技碩士班 === 105 === In this study, the Specific Resistance analysis of amorphous vanadium oxide, vanadium oxide film were prepared by DC magnetron sputtering on silicon, prepare temperature at 300℃ to 400℃,film thickness at 100 to 200nm, Using different methods of analysis ,sample were prepared Circular Transfer Length Method with lithography technology, the vanadium metal is deposited on the vanadium oxide film by DC magnetron, Finally, Using tube furnace to anneal, Focus different annealing conditions to measure the electrical properties of samples, Then extracted specific contact resistivity, The electrical measurement with Micro - probe measurement system and KEITHLEY 2400 for I-V characteristic measurement. Resistance trimming method by Laser engraving machine.