| Summary: | 碩士 === 國立臺灣科技大學 === 電子工程系 === 105 === In this thesis, the wavelength demultiplexer is designed and fabricated on the silicon wafer for the fiber optical communications, which includes input/output coupling and concave diffraction grating. The EPIPPROP and FIMMPROP from the commercial software of Photon Design are dedicated to the simulation of Echelle grating and distributed Bragg reflector (DBR) grating, respectively. In order to integrate Echelle grating into the surface plasmon interferometer for spectrometer applications, a 0.8-nm channel spacing is implemented and demonstrated in the simulation. The siliconwire waveguide width is 0.45 μm and concave grating is coated with the aluminum metal for better reflection. The experimental data on Echelle grating will be based on the DBR grating with 0.5-duty cycle, 0.3-µm period, and 6 period number.
There are three coupling approaches in surface plasmons: grating coupler, optical waveguide coupler and prism coupler. In this thesis, a siliconwire based biological sensors through surface plasma polaritons will be demonstrated. The main structure is to implement the surrounding metals on top and sidewall of the silicon-wire for biosensing. When the optical mode passes through the sensor area, the surface plasma waves are induced in the surfaces between metal and dielectric films and form the interference phenomena. At the end of sensing region, three surface plasmon polaritons will combine together and illustrate interferograms.
In addition to the surface plasmon interference in siliconwire, a device length caused phase variation could be utilized for interference biosensing. Therefore, we design a microring resonator under different quality factor and concentrations to be characterized by the optical fiber low coherence interferometery through interferogram shift.
The process in the National Nano Device Laboratories (NDL) will include Echelle grating and surface plasmon interferometer, which includes the photolithography, etch, physical vapor deposition, plasma-enhanced chemical vapor deposition, and scanning electron microscopy. Due to NDL fabrication limitation, the DBR grating with the 0.3-μm period from Echelle spectrometer grating was sent out and processed in IMEC (Interuniversity MicroElectronics Center).
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