Study of deposition-rate and irradiation-flux dependence of ClAlPc on Au(111)

碩士 === 國立清華大學 === 物理系 === 105 === The deposition-rate and irradiation-flux dependence of ClAlPc adsorbed on the Au(111) crystal was investigated by the angular-resolved photoelectron spectroscopy (ARPES). This thesis reveals that different depositing rates of ClAlPc on Au(111) crystal surface result...

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Bibliographic Details
Main Authors: Huang,Bo Wen, 黃柏文
Other Authors: Tang,Shu Jung
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/dshg7g
Description
Summary:碩士 === 國立清華大學 === 物理系 === 105 === The deposition-rate and irradiation-flux dependence of ClAlPc adsorbed on the Au(111) crystal was investigated by the angular-resolved photoelectron spectroscopy (ARPES). This thesis reveals that different depositing rates of ClAlPc on Au(111) crystal surface result in different adsorption configurations of ClAlPc; at the slow rate of 0.02 Å/min, Cl-down configuration dominates but at the fast rate of 0.2 Å/min Cl-down and Cl-up configurations coexist. We further studied irradiation-exposure and post-annealing effects on the samples under these two conditions. For the case of slow deposition, the dominant Cl-down configuration is vulnerable to the irradiation; the Cl-down molecules are inclined by the radiation of low flux, 2.1X10^15 photons/sec, and desorbed by the radiation of high flux, 6.4X10^15 photons/sec, according to the change of molecular orbital states, the Au surface state, and vacuum level. Post-annealing effects also imply similar behaviors. However for the case of fast deposition, the coexistent configurations are very robust to both irradiation-exposure and post-annealing effects.