| Summary: | 碩士 === 國立屏東科技大學 === 機械工程系所 === 105 === In recent years, global environmental pollution and energy have been an important concern. The titanium dioxide band gap is 3.2 eV, It is a non-toxic, high-performance and low-price and other advantages. Is very suitable as a photocatalyst material, and is widely used in photocatalysis, cosmetics and other research areas.
In this study, the titanium dioxide film was grown on a glass substrate by electron beam evaporation (Electron Beam Evaporation), and the thermal annealing treatment was carried out in the atmospheric environment to investigate the effect of thermal annealing on the properties of the titanium dioxide film.
In this study, X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM) were used to analyze the surface structure, morphology, roughness and grain size of the films. Spectrophotometer (UV-vis.) can analysis materials optical properties that measured transmittance, reflectance, absorbance and energy gap. Finally, the effects of different heat treatment conditions on the properties of titanium dioxide were investigated by photocatalytic degradation of methylene blue activity and efficiency.
The results of XRD analysis show that the TiO2 prepared in this experiment is anatase structure, and the characteristic peaks of TiO2 are generated after thermal annealing of 300 ℃. It is known from SEM that the thermal annealing from 300 ℃ has increased to an anatase structure after 1 hour, so that grain coarsening of TiO2 can be observed. The roughness is obtained by AFM analysis. UV-vis. analysis showed that the energy gap was 3.31 eV to 3.36 eV. Finally, it was found that the annealing temperature was 400 ℃, and the photocatalytic activity was better.
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