Effects of post-annealing on the properties of TiO2/Al stacking films
碩士 === 國立屏東科技大學 === 機械工程系所 === 105 === This study used aluminum stack to change the properties of titanium dioxide, and the activity of degradation of methylene blue was investigated by ultraviolet light irradiation. And why use titanium dioxide because the titanium dioxide crystal structure has two...
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ndltd-TW-105NPUS54890182019-05-16T00:00:24Z http://ndltd.ncl.edu.tw/handle/779wa5 Effects of post-annealing on the properties of TiO2/Al stacking films 沉積後退火對TiO2/Al堆疊膜特性之影響 Liao, Zhe-Qing 廖哲慶 碩士 國立屏東科技大學 機械工程系所 105 This study used aluminum stack to change the properties of titanium dioxide, and the activity of degradation of methylene blue was investigated by ultraviolet light irradiation. And why use titanium dioxide because the titanium dioxide crystal structure has two applications often used in all aspects, respectively, rutile and anatase structure, while the anatase phase titanium dioxide has a better photocatalyst activity, energy gap of about 3.2 eV and in many applications have a good performance. Therefore, in this experiment, TiO2/Al stack film was prepared by vapor deposition method, and the difference in the different annealing temperatures was compared by annealing at 250 ℃, 300 ℃, 350 ℃, 400 ℃ and 450 ℃ In this study, X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM) were used to analyze the surface morphology, particle size, crystal structure. The optical properties such as transmittance, absorbance and energy gap of the test piece were measured by visible ultraviolet light spectrophotometer (UV-vis.). Finally, the reaction experiment of degradation of methylene blue with ultraviolet light was carried out to find out the annealing temperature with different photodegradation activity at different annealing temperatures. Experiments show that, from the XRD results, it was found that the crystalline phase of TiO2 was not observed before 300 ℃ but the characteristic peaks of TiO2 were found after 350 ℃. The SEM results show that the grains grow slowly as the temperature rises. The surface roughness of AFM increases the surface particle size of the table by UV-vis. analysis. The penetration rate is preferably about 75% after 400 ℃, and the energy gap at the initial growth and annealing is 3.2 eV and 3.3 eV, respectively. From the photodegradation found that the best degradation efficiency of 400 ℃ and methylene blue concentration of 0.24375 mM when the effect is most obvious. Teog, Lay Gaik 張莉毓 2017 學位論文 ; thesis 58 zh-TW |
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碩士 === 國立屏東科技大學 === 機械工程系所 === 105 === This study used aluminum stack to change the properties of titanium dioxide, and the activity of degradation of methylene blue was investigated by ultraviolet light irradiation. And why use titanium dioxide because the titanium dioxide crystal structure has two applications often used in all aspects, respectively, rutile and anatase structure, while the anatase phase titanium dioxide has a better photocatalyst activity, energy gap of about 3.2 eV and in many applications have a good performance. Therefore, in this experiment, TiO2/Al stack film was prepared by vapor deposition method, and the difference in the different annealing temperatures was compared by annealing at 250 ℃, 300 ℃, 350 ℃, 400 ℃ and 450 ℃
In this study, X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM) were used to analyze the surface morphology, particle size, crystal structure. The optical properties such as transmittance, absorbance and energy gap of the test piece were measured by visible ultraviolet light spectrophotometer (UV-vis.). Finally, the reaction experiment of degradation of methylene blue with ultraviolet light was carried out to find out the annealing temperature with different photodegradation activity at different annealing temperatures.
Experiments show that, from the XRD results, it was found that the crystalline phase of TiO2 was not observed before 300 ℃ but the characteristic peaks of TiO2 were found after 350 ℃. The SEM results show that the grains grow slowly as the temperature rises. The surface roughness of AFM increases the surface particle size of the table by UV-vis. analysis. The penetration rate is preferably about 75% after 400 ℃, and the energy gap at the initial growth and annealing is 3.2 eV and 3.3 eV, respectively. From the photodegradation found that the best degradation efficiency of 400 ℃ and methylene blue concentration of 0.24375 mM when the effect is most obvious.
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author2 |
Teog, Lay Gaik |
author_facet |
Teog, Lay Gaik Liao, Zhe-Qing 廖哲慶 |
author |
Liao, Zhe-Qing 廖哲慶 |
spellingShingle |
Liao, Zhe-Qing 廖哲慶 Effects of post-annealing on the properties of TiO2/Al stacking films |
author_sort |
Liao, Zhe-Qing |
title |
Effects of post-annealing on the properties of TiO2/Al stacking films |
title_short |
Effects of post-annealing on the properties of TiO2/Al stacking films |
title_full |
Effects of post-annealing on the properties of TiO2/Al stacking films |
title_fullStr |
Effects of post-annealing on the properties of TiO2/Al stacking films |
title_full_unstemmed |
Effects of post-annealing on the properties of TiO2/Al stacking films |
title_sort |
effects of post-annealing on the properties of tio2/al stacking films |
publishDate |
2017 |
url |
http://ndltd.ncl.edu.tw/handle/779wa5 |
work_keys_str_mv |
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1719158467777789952 |