Low Temperature Growth New Ge/Si Films and Application for Silicon Based Optoelectronic Device Development
博士 === 國立中央大學 === 材料科學與工程研究所 === 105 === In this information explosion era, the topic of energy and communication are payed attention to many people. The Ge/Si technology provide many advantage to develop those topic, such as: quasi-direct bandgap, lattice match between GaAs and Si materials, easy m...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/68495211238312183148 |