The SnOx gate oxide-based III-Nitride High Electron Mobility Transistors
碩士 === 國立成功大學 === 微電子工程研究所 === 105
Main Authors: | Cheng-YuHsieh, 謝呈榆 |
---|---|
Other Authors: | Ricky Wenkuei Chuang |
Format: | Others |
Language: | zh-TW |
Published: |
2017
|
Online Access: | http://ndltd.ncl.edu.tw/handle/rd23jh |
Similar Items
-
Thermal Stability of SnOx/AZO/Ag/NiCrOx/SnOx Each Layer in Films
by: Chen,Hung-Jen, et al.
Published: (2016) -
Data Investigation of SnOx/AZO/Ag/NiCrOx /SnOx Films Applied in SPSS 19
by: Hsu,Meng-Lin, et al.
Published: (2018) -
Effect of Hydrogen Plasma on Microstructure Properties of Each Layer in SnOx/NiCrOx/Ag/AZO/SnOx Films
by: CHU,EN-PING, et al.
Published: (2016) -
Effect of Hydrogn Plasma on Optical Properties of Each Layer in SnOx/NiCrOx/Ag/AZO/SnOx Films
by: CHE-WEI,KAO, et al.
Published: (2016) -
Effect of Hydrogen Plasma on SnOX Films
by: CHOU,CHIN-JEN, et al.
Published: (2016)