Sputtering deposition of TiN thin films with different morphologies and resistivities for direct methanol fuel cells applications
碩士 === 國立中興大學 === 材料科學與工程學系所 === 105 === The object of this study is to prepare different morphologies and resistivities of TiN films using nitrogen as reactive gas by unbalanced magnetron reactive sputtering. The TiN thin films with different morphologies and resistivities were achieved by controll...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/10507728947638168138 |