The Transmittance Study of SiNx Film for Display Technology Application
碩士 === 國立中興大學 === 光電工程研究所 === 105 === This experiment aims to grow low stress silicon nitride film on glass substrate with Plasma Enhanced Chemical Vapor Deposition (PECVD), discuss the physical characteristics of silicon nitride film, and further apply the silicon nitride film to TFT-LCD. It intend...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/52738401161918957985 |