Effects of Sputtering Parameters on the Performance of High-entropy Alloys (AlCrNbSiTiV)N Thin Films
碩士 === 龍華科技大學 === 機械工程系碩士班 === 105 === The main purpose of this study is to research (AlCrNbSiTiV)N thin films deposition on cermet cutting tools (TNMG160404R-UM T1200A) and glass substrates deposited by DC reactive magnetron sputtering. To explore different substrate temperatures (25, 100, 200, 300...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/mvf5gz |