| Summary: | 碩士 === 龍華科技大學 === 化工與材料工程系碩士班 === 105 === This report presents a complete document of an atmospheric pressure cold plasma sterilization system for escalator handrail disinfection. The document has been prepared to fulfill its future needs such as patent applications, commercialization, form improvements, plasma performance parameters identification for various applications, future industrial production, etc. The aim of this report is to ensure a successful prototype development of this cold plasma escalator cleaning equipment, and finally the public acceptance of this plasma sterilization technology.
A patent map has been made according to the type and scope of patent application, it reveals that in the past five years, there has been 4807 cold plasma sterilization applications worldwide in the area of biomedical engineering. Among these applications, there is a case, US 9034270B2, which is similar to the design of this cold plasma escalator cleaning equipment. A thorough investigation has been made therefore to differentiate these two patent applications, result of the analysis confirms that the subject of this report achieves an effective sterilization rate, up to 90%, after 6 seconds of plasma treatment. In addition, the equipment is compatible to the existing escalator from most of the factories, no changing or modification of the escalator structure is required. The design of this device therefore conforms to the invention patent elements such as "industry availability", "novelty" and "progressive".
Experimental prototype of this escalator disinfection device with technology of atmospheri¬c pressure cold plasma has been successfully completed based on the conceptual design, the optimized performance parameters are the frequency of 7kHz~15kHz, the voltage of 3kV~4.5kV pulse voltage, and the total power consumption of 900W ~ 1100W. This report also confirms that the design of this atmospheric pressure cold plasma escalator sterilization device has successfully completed the examination of the invention patent of Taiwan, the reply of the invention patent of the United States and the approval of the new Chinese patent. It is about to be transformed into industrial prototype, and ready to participate in future government-related business competition.
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