Ti/Al Films Applied in Low Emissivity Glass
碩士 === 崑山科技大學 === 電機工程研究所 === 105 === Titanium and aluminum films with 5 nm in each layer were evaporated on glass (Ti (5 nm)/Al(5 nm)/glass. Low emissivity related properties: microstructure, electrical and optical properties were measured. The optimum condition of materials and process condition...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2017
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| Online Access: | http://ndltd.ncl.edu.tw/handle/13033389465093619589 |
| Summary: | 碩士 === 崑山科技大學 === 電機工程研究所 === 105 === Titanium and aluminum films with 5 nm in each layer were evaporated on glass (Ti (5 nm)/Al(5 nm)/glass. Low emissivity related properties: microstructure, electrical and optical properties were measured. The optimum condition of materials and process condition for obtaining the low emissivity were analyzed and observed.
The sheet resistance, average transmission in visible range and reflection in near infrared region of Ti (5 nm)/Al(5 nm)/glassare 39.35KΩ/square,78.7% and 10.7% This result could be applied in low emissivity coating.
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