| Summary: | 碩士 === 國立金門大學 === 電子工程學系碩士班 === 105 === TiO2 is a kind of material which is stable in chemical properties and has the characteristics of photocatalyst, and it is cheap and stable. It is widely used and discussed. However, because the energy gap of TiO2 is 3.2 eV, the wavelength range of light absorption is narrow, and most of the absorption wavelength In the ultraviolet zone, the use of low proportion of sunlight (ultraviolet light accounted for about 5% of the sun) and can not be widely used in daily life. In recent years, many scholars in order to overcome this problem, try a variety of different methods to improve the activity of TiO2 and visible light absorption rate. Aiming at the problem of light absorption range of TiO2. In this study, a high-quality TiO2 photocatalyst thin film is prepared by bipolar pulsed magnetron sputtering system, and TiO2 / W / V / Cr thin films are deposited with double targets to reduce the energy gap of TiO2 and shift the light absorption range to 400 ~ 550 nm visible light range and then achieve the purpose of visible light catalyst. With the increase of W / V / Cr target sputtering power, the deposition rate increases with the increase of 1.35 ± 0.11 (nm / min) /1.33 ± 0.02 (nm / min) / 1.24 ± 0.31 (nm / min).
SEM surface morphology showed uniform clusters of particles; and cross-sectional morphology are obvious columnar structure. The films exhibited by XRD are all of the anatase phase structure of TiO2 core structure. The preferred orientation of all films is (101), and the third element Cr, V and W are added with different power. The surface and cross- The effect of the film can be observed in the film surface by the formation of a small cluster of clusters, cluster particles evenly distributed. (-311) crystal plane of monoclinic Cr2TiO5, the results of the bond analysis show that Ti2p3/2 of all TiO2/Cr films are all Ti2p3/2 of TiO2 thin film doped with TiO2/Cr at the sputtering power of 150W or more and about 43 degrees Ti4+ is the main component, and the TiO2 composition of O1s decreases with the increase of Cr sputtering power. The contact angle of TiO2/Cr film is 23 °, and the degradation rate of TiO2/Cr film is worse than that of optimized TiO2 film, and the degradation rate of methylene blue is worse with the increase of Cr. In the doped TiO2/V film, when the power boost does not produce a new peak, it means that V is stored in the TiO2 film in the form of solid solution. The Ti2p3/2 films of all TiO2/V films were all Ti4+, and the degradation rate of methylene blue was improved with the increase of power. (10) crystal plane, surface and cross-sectional morphology, and the morphology of all the films is observed by the surface morphology of the TiO2/W thin films. , The cluster particles are evenly distributed. With the increase of the tungsten target sputtering power, the cluster particles are obviously increased, and the tungsten atoms are excited from the target, so that the clusters are increased. Bond analysis of all TiO2/W thin film Ti2p3/2 are all Ti4+ components, W4f7/2 with the W sputtering power increases from W5+ slowly converted to W6+ components. In this study, the optimized TiO2/W thin films were 50W, and the optimum degradation rate was 100% and 12.11 °, respectively, when the degradation rate and optimum hydrophilicity of methylene blue were 8 hours. (101) crystal plane is obtained. When the sputtering power of tungsten vanadium alloy is increased, the peak of the (101) crystal plane is obtained when the crystal structure of the thin film is Ascension. The crystal structure analysis shows that the cluster particles are directly proportional to the deposition rate. With the tungsten vanadium alloy target sputtering power to enhance the cluster particles from the water chestnut into a round. Sectional structure in the tungsten vanadium alloy target sputtering power of 150 W, with a smooth structure, other films have columnar structure. Water contact angle with tungsten vanadium alloy target sputtering power increased from 59 ° to 29 °, improved hydrophilic properties, methylene blue retreat test results, with the tungsten vanadium alloy target sputtering power increases, with good abstraction effect 50W data Reduced from 59 ° to 29 °. The results show that the wettability of TiO2 / WV film is worse when WV sputtering power increases. Therefore, when the WV sputtering power is 50 W, the hydrophilic TiO2/WV film can be prepared and the best Degradation effect of TiO2/WV film.
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