Chemical Waste Recycling Research for Applying Membrane Technology to Process Wafer of Clean Solution of Hydrogen Peroxide (H2O2)

碩士 === 國立雲林科技大學 === 環境與安全衛生工程系 === 104 === The film technology (Membrane technology) has been used in waste water treatment over past few years, although plants can significantly reduce the area of processing unit, the high maintenance costs and pores on films can easily be clog by impurities, In to...

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Main Authors: Li-Chin Wang, 王歷勤
Other Authors: Chi-Min Shu
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/39612460452890808077
id ndltd-TW-104YUNT0633007
record_format oai_dc
spelling ndltd-TW-104YUNT06330072017-09-10T04:29:31Z http://ndltd.ncl.edu.tw/handle/39612460452890808077 Chemical Waste Recycling Research for Applying Membrane Technology to Process Wafer of Clean Solution of Hydrogen Peroxide (H2O2) 化學品廢液回收再利用研究以薄膜技術處理晶圓清潔液之過氧化氫 (H2O2) 為例 Li-Chin Wang 王歷勤 碩士 國立雲林科技大學 環境與安全衛生工程系 104 The film technology (Membrane technology) has been used in waste water treatment over past few years, although plants can significantly reduce the area of processing unit, the high maintenance costs and pores on films can easily be clog by impurities, In today, there is a lot of demand from electronics and industry, and many industrial have a higher costs problem on its chemical consumption, and therefore the idea of re-use of chemical film technology getting attention by the government and manufacturers. For example from cutting fluid by solar energy, there are a number of treatment and recycling plants used in the film technology at end of process treatment. Reused on high-purity of chemical liquid, based on the protection of the original manufacturers of chemical liquid formulations as well as higher cost of high purity chemical solution is now an important and necessary topic. Therefore, compared to the traditional chemical treatment method, there is widespread exist a safety risk on physical treatment method. Physical treatment of film technology for reusing have its advantages, the main purpose of this study is addressing on the waste cleaning fluid from wet process of wafer (Such as HCl / H2O2 / H2O, H2SO4 / H2O2 / H2O, NH4OH / H2O2 / H2O) . The material which cleaning fluid to be removed, used in this study was hydrogen peroxide after treatment for reusing the cleaning fluid. This study choose the cleaning solution after removal of hydrogen peroxide and used film return the original high purity component (HCl / H2SO4 / NH4OH) to reuse, recycling or other ways. Finally observe the removal efficiency of film. Keywords : Membrane,Wastewater engineering,Recycling, Piranha clean, Hydrogen peroxide. Chi-Min Shu 徐啟銘 2016 學位論文 ; thesis 47 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立雲林科技大學 === 環境與安全衛生工程系 === 104 === The film technology (Membrane technology) has been used in waste water treatment over past few years, although plants can significantly reduce the area of processing unit, the high maintenance costs and pores on films can easily be clog by impurities, In today, there is a lot of demand from electronics and industry, and many industrial have a higher costs problem on its chemical consumption, and therefore the idea of re-use of chemical film technology getting attention by the government and manufacturers. For example from cutting fluid by solar energy, there are a number of treatment and recycling plants used in the film technology at end of process treatment. Reused on high-purity of chemical liquid, based on the protection of the original manufacturers of chemical liquid formulations as well as higher cost of high purity chemical solution is now an important and necessary topic. Therefore, compared to the traditional chemical treatment method, there is widespread exist a safety risk on physical treatment method. Physical treatment of film technology for reusing have its advantages, the main purpose of this study is addressing on the waste cleaning fluid from wet process of wafer (Such as HCl / H2O2 / H2O, H2SO4 / H2O2 / H2O, NH4OH / H2O2 / H2O) . The material which cleaning fluid to be removed, used in this study was hydrogen peroxide after treatment for reusing the cleaning fluid. This study choose the cleaning solution after removal of hydrogen peroxide and used film return the original high purity component (HCl / H2SO4 / NH4OH) to reuse, recycling or other ways. Finally observe the removal efficiency of film. Keywords : Membrane,Wastewater engineering,Recycling, Piranha clean, Hydrogen peroxide.
author2 Chi-Min Shu
author_facet Chi-Min Shu
Li-Chin Wang
王歷勤
author Li-Chin Wang
王歷勤
spellingShingle Li-Chin Wang
王歷勤
Chemical Waste Recycling Research for Applying Membrane Technology to Process Wafer of Clean Solution of Hydrogen Peroxide (H2O2)
author_sort Li-Chin Wang
title Chemical Waste Recycling Research for Applying Membrane Technology to Process Wafer of Clean Solution of Hydrogen Peroxide (H2O2)
title_short Chemical Waste Recycling Research for Applying Membrane Technology to Process Wafer of Clean Solution of Hydrogen Peroxide (H2O2)
title_full Chemical Waste Recycling Research for Applying Membrane Technology to Process Wafer of Clean Solution of Hydrogen Peroxide (H2O2)
title_fullStr Chemical Waste Recycling Research for Applying Membrane Technology to Process Wafer of Clean Solution of Hydrogen Peroxide (H2O2)
title_full_unstemmed Chemical Waste Recycling Research for Applying Membrane Technology to Process Wafer of Clean Solution of Hydrogen Peroxide (H2O2)
title_sort chemical waste recycling research for applying membrane technology to process wafer of clean solution of hydrogen peroxide (h2o2)
publishDate 2016
url http://ndltd.ncl.edu.tw/handle/39612460452890808077
work_keys_str_mv AT lichinwang chemicalwasterecyclingresearchforapplyingmembranetechnologytoprocesswaferofcleansolutionofhydrogenperoxideh2o2
AT wánglìqín chemicalwasterecyclingresearchforapplyingmembranetechnologytoprocesswaferofcleansolutionofhydrogenperoxideh2o2
AT lichinwang huàxuépǐnfèiyèhuíshōuzàilìyòngyánjiūyǐbáomójìshùchùlǐjīngyuánqīngjiéyèzhīguòyǎnghuàqīngh2o2wèilì
AT wánglìqín huàxuépǐnfèiyèhuíshōuzàilìyòngyánjiūyǐbáomójìshùchùlǐjīngyuánqīngjiéyèzhīguòyǎnghuàqīngh2o2wèilì
_version_ 1718532046692810752