Chemical Waste Recycling Research for Applying Membrane Technology to Process Wafer of Clean Solution of Hydrogen Peroxide (H2O2)
碩士 === 國立雲林科技大學 === 環境與安全衛生工程系 === 104 === The film technology (Membrane technology) has been used in waste water treatment over past few years, although plants can significantly reduce the area of processing unit, the high maintenance costs and pores on films can easily be clog by impurities, In to...
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ndltd-TW-104YUNT06330072017-09-10T04:29:31Z http://ndltd.ncl.edu.tw/handle/39612460452890808077 Chemical Waste Recycling Research for Applying Membrane Technology to Process Wafer of Clean Solution of Hydrogen Peroxide (H2O2) 化學品廢液回收再利用研究以薄膜技術處理晶圓清潔液之過氧化氫 (H2O2) 為例 Li-Chin Wang 王歷勤 碩士 國立雲林科技大學 環境與安全衛生工程系 104 The film technology (Membrane technology) has been used in waste water treatment over past few years, although plants can significantly reduce the area of processing unit, the high maintenance costs and pores on films can easily be clog by impurities, In today, there is a lot of demand from electronics and industry, and many industrial have a higher costs problem on its chemical consumption, and therefore the idea of re-use of chemical film technology getting attention by the government and manufacturers. For example from cutting fluid by solar energy, there are a number of treatment and recycling plants used in the film technology at end of process treatment. Reused on high-purity of chemical liquid, based on the protection of the original manufacturers of chemical liquid formulations as well as higher cost of high purity chemical solution is now an important and necessary topic. Therefore, compared to the traditional chemical treatment method, there is widespread exist a safety risk on physical treatment method. Physical treatment of film technology for reusing have its advantages, the main purpose of this study is addressing on the waste cleaning fluid from wet process of wafer (Such as HCl / H2O2 / H2O, H2SO4 / H2O2 / H2O, NH4OH / H2O2 / H2O) . The material which cleaning fluid to be removed, used in this study was hydrogen peroxide after treatment for reusing the cleaning fluid. This study choose the cleaning solution after removal of hydrogen peroxide and used film return the original high purity component (HCl / H2SO4 / NH4OH) to reuse, recycling or other ways. Finally observe the removal efficiency of film. Keywords : Membrane,Wastewater engineering,Recycling, Piranha clean, Hydrogen peroxide. Chi-Min Shu 徐啟銘 2016 學位論文 ; thesis 47 zh-TW |
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碩士 === 國立雲林科技大學 === 環境與安全衛生工程系 === 104 === The film technology (Membrane technology) has been used in waste water treatment over past few years, although plants can significantly reduce the area of processing unit, the high maintenance costs and pores on films can easily be clog by impurities, In today, there is a lot of demand from electronics and industry, and many industrial have a higher costs problem on its chemical consumption, and therefore the idea of re-use of chemical film technology getting attention by the government and manufacturers. For example from cutting fluid by solar energy, there are a number of treatment and recycling plants used in the film technology at end of process treatment.
Reused on high-purity of chemical liquid, based on the protection of the original manufacturers of chemical liquid formulations as well as higher cost of high purity chemical solution is now an important and necessary topic. Therefore, compared to the traditional chemical treatment method, there is widespread exist a safety risk on physical treatment method. Physical treatment of film technology for reusing have its advantages, the main purpose of this study is addressing on the waste cleaning fluid from wet process of wafer (Such as HCl / H2O2 / H2O, H2SO4 / H2O2 / H2O, NH4OH / H2O2 / H2O) . The material which cleaning fluid to be removed, used in this study was hydrogen peroxide after treatment for reusing the cleaning fluid. This study choose the cleaning solution after removal of hydrogen peroxide and used film return the original high purity component (HCl / H2SO4 / NH4OH) to reuse, recycling or other ways. Finally observe the removal efficiency of film.
Keywords : Membrane,Wastewater engineering,Recycling, Piranha clean, Hydrogen peroxide.
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author2 |
Chi-Min Shu |
author_facet |
Chi-Min Shu Li-Chin Wang 王歷勤 |
author |
Li-Chin Wang 王歷勤 |
spellingShingle |
Li-Chin Wang 王歷勤 Chemical Waste Recycling Research for Applying Membrane Technology to Process Wafer of Clean Solution of Hydrogen Peroxide (H2O2) |
author_sort |
Li-Chin Wang |
title |
Chemical Waste Recycling Research for Applying Membrane Technology to Process Wafer of Clean Solution of Hydrogen Peroxide (H2O2) |
title_short |
Chemical Waste Recycling Research for Applying Membrane Technology to Process Wafer of Clean Solution of Hydrogen Peroxide (H2O2) |
title_full |
Chemical Waste Recycling Research for Applying Membrane Technology to Process Wafer of Clean Solution of Hydrogen Peroxide (H2O2) |
title_fullStr |
Chemical Waste Recycling Research for Applying Membrane Technology to Process Wafer of Clean Solution of Hydrogen Peroxide (H2O2) |
title_full_unstemmed |
Chemical Waste Recycling Research for Applying Membrane Technology to Process Wafer of Clean Solution of Hydrogen Peroxide (H2O2) |
title_sort |
chemical waste recycling research for applying membrane technology to process wafer of clean solution of hydrogen peroxide (h2o2) |
publishDate |
2016 |
url |
http://ndltd.ncl.edu.tw/handle/39612460452890808077 |
work_keys_str_mv |
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