A Study to improve the IC apperance performance of laser marking by using Design of Experiment

• Main Authors: CHEN,CHIH-FENG, 陳致鋒
• Other Authors: Torng,Chau-Chen
• Format: Others
• Language: zh-TW
• Published: 2016
• Online Access: http://ndltd.ncl.edu.tw/handle/87766849062530868444

碩士 === 國立雲林科技大學 === 工業工程與管理系 === 104 === As times of evolution, demand of customer and multi-function background, Memory has been developing from DDR SDRAM (Double Data Rate Synchronous Dynamic Random Access Memory) Series to LPDDR Series, it be used in traditional Personal Computer, smart device, automobile devices, etc. The appearance performance has developed with light and thick orientation progressively. Green environmental awareness has restricted by European Communities in recently years, bring more degree of difficultly for choosing with suitable materials. Laser marking applied in semiconductor assembly and test industry, it can provide the identification by using laser beam to burn the surface of IC, as judgment in follow-up processes. When IC trend to light and thick orientation development, it need to modify the parameter of Laser marking. The present study focus on the effect of performance by using Laser marking in new product. Find the factors by Fishbond diagram, and collocated with DOE to experiment, then analysis the best parameters by Main effects plot, Interaction plot and Contour Plot of Minitab. Finally, confirm the repetition result in the study. The study found out the influence degree of appearance performance from major to minor for factor part is current , velocity, frequency. For interaction of factor ,from major to minor is velocity and frequency, current and velocity. The much better parameter combination is current (14 A) with velocity (300 MM/Sec) and frequency (62.7 KHZ). The repetition for quality raised 27% than mass parameter. Keywords：Semiconductor Assembly and Testing, Memory, Laser marking, Design of 　　　　　 experiment.