| Summary: | 碩士 === 國立臺北科技大學 === 材料科學與工程研究所 === 104 === TaN thin film coatings are known to have good mechanical properties, impact toughness, as well as good biocompatibility. However, the friction coefficient of these films is sometimes too high, or the hemocompatibility is poor. The purpose of this study is to reduce the friction coefficient and lower the surface energy of TaN coating by introducing CFx into the nitride coatings. CFx–doped TaN films were deposited on silicon and tool steel substrates by magnetron sputtering. During the deposition process, C2F6 gas with various flow rates was added. After deposition, these films were then characterized using XRD, XPS, FTIR, FESEM, as well as a tribometer. The tribo-tests were carried out with and without argon flow. Surface energies of the films were also analyzed with contact angle measurement system. According to structural analysis, TaN phase would transform to Ta(FCN) with the increase of the fluoride gas flow rate, which would cause the decrease of friction coefficient and surface energy. According to the results obtained from tribotesting, it is found the increase of CFx would reduce the effects of moisture and oxygen on friction coefficient. According to the results of corrosion resistance and antibacterial test, it is found the increase of F contents would enhance the effect of antibacterial efficiency and corrosion resistance. Moreover, the adsorbed albumin to fibrinogen ratio is increased with the CFx doping. .These evidences illustrate that hemocompatibility of the TaN thim film can be significantly enhanced through the formation of CFx doping. The prepared films may have good hemocompatibility and wear-resistance.
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