Data Compression Ratio-aware Detailed Routing for Multiple E-Beam Direct Write Systems
碩士 === 國立臺灣大學 === 電子工程學研究所 === 104 === The feature size of Integrated Circuits(IC) are shrinking down along with the advancement of technology, but the resolution of the ArF laser is far from the target for next generation lithography. Electron beam (E-beam) lithography, with its high-accuracy chara...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2015
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| Online Access: | http://ndltd.ncl.edu.tw/handle/49819815702155267265 |