| Summary: | 碩士 === 國立臺灣大學 === 電子工程學研究所 === 104 === The feature size of Integrated Circuits(IC) are shrinking down along with the
advancement of technology, but the resolution of the ArF laser is far from the target for
next generation lithography. Electron beam (E-beam) lithography, with its
high-accuracy characteristic, is very likely to become the main role in next generation
lithography.
Because of the accuracy of E-beam, the exact information of the circuit has to be
delivered to the E-beam emitter. However, circuits nowadays has become so
complicated that the successfulness of this process relies on the speed of data
transmission, which is not sufficiently fast even with technologies today. So in practice,
data should be compressed first, transmitted by optic fibers, and then decompressed in
the E-beam machines.
In this thesis, we proposed a detailed routing method to improve data compression
quality before applying the actual compression algorithm. The results of experiments
show that, with one particular data compression algorithm, LineDiff Entropy, chosen,
we improve data compression ratio with our proposed detailed router. And we can
conclude that considering data compression ratio in physical design phase is a field
worth studying.
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