Effects of P-Type Layer and Transparent Conducting Oxides Film on Ge-on-Si Photodetector

碩士 === 國立中央大學 === 光電科學與工程學系 === 104 === In recent decades, near-infrared-region photodetector has attracted attention gradually with development of fiber-optical communication. Germanium-on-Silicon photodetector not only can detect NIR light but also contain the advantages of low cost and easy integ...

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Main Authors: Lu-Tzu Liu, 劉律慈
Other Authors: Jenq-Yang Chang
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/8vczvc
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spelling ndltd-TW-104NCU056140322019-05-15T23:01:21Z http://ndltd.ncl.edu.tw/handle/8vczvc Effects of P-Type Layer and Transparent Conducting Oxides Film on Ge-on-Si Photodetector 摻雜層與透明導電薄膜對於矽基鍺光偵測器影響之研究 Lu-Tzu Liu 劉律慈 碩士 國立中央大學 光電科學與工程學系 104 In recent decades, near-infrared-region photodetector has attracted attention gradually with development of fiber-optical communication. Germanium-on-Silicon photodetector not only can detect NIR light but also contain the advantages of low cost and easy integration. However, the defects due to the heterojunction between Si and Ge would increase the dark current which causes power consumption and signal interference so decreasing the dark current of a Ge-on-Si photodetector becomes an important issue. In this study, we fabricated different p-type layer of a photodetector and investigated its effect. In addition, we employed Indium Tin Oxide (ITO) thin film on a photodetector to lower the dark current. The photodetectors fabricated in this research are p-i-n structure. At the beginning, we used Reduced-Pressure Chemical Vapor Deposition (RPCVD) to deposit intrinsic germanium (i-Ge) on n-type silicon substrate. Then, different kinds of p-type layer were grown by RPCVD and Electron Cyclotron Resonance Chemical Vapor Deposition (ECRCVD). The results revealed that photodetector with p+-Ge layer grown by ECRCVD exhibited higher responsivity of 0.171 A/W than others. The reason is due to the stronger built-in electric field caused by heavier doping concentration in p-type layer. On the other hand, we grew different characteristic ITO thin film by controlling the process parameters in Radio Frequency (RF) Sputtering system, argon flow, oxygen flow and ambient pressure. Also, we employed these ITO thin films on photodetector to lower the dark current and investigate on the relationship between them. Here, we have demonstrated a Ge-on-Si photodetector with ITO layer and its performance is dark current of 0.12 μA at -3 V bias, dark current density of 0.048 mA/cm2. Jenq-Yang Chang Yen-Hung Chen 張正陽 陳彥宏 2016 學位論文 ; thesis 75 zh-TW
collection NDLTD
language zh-TW
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description 碩士 === 國立中央大學 === 光電科學與工程學系 === 104 === In recent decades, near-infrared-region photodetector has attracted attention gradually with development of fiber-optical communication. Germanium-on-Silicon photodetector not only can detect NIR light but also contain the advantages of low cost and easy integration. However, the defects due to the heterojunction between Si and Ge would increase the dark current which causes power consumption and signal interference so decreasing the dark current of a Ge-on-Si photodetector becomes an important issue. In this study, we fabricated different p-type layer of a photodetector and investigated its effect. In addition, we employed Indium Tin Oxide (ITO) thin film on a photodetector to lower the dark current. The photodetectors fabricated in this research are p-i-n structure. At the beginning, we used Reduced-Pressure Chemical Vapor Deposition (RPCVD) to deposit intrinsic germanium (i-Ge) on n-type silicon substrate. Then, different kinds of p-type layer were grown by RPCVD and Electron Cyclotron Resonance Chemical Vapor Deposition (ECRCVD). The results revealed that photodetector with p+-Ge layer grown by ECRCVD exhibited higher responsivity of 0.171 A/W than others. The reason is due to the stronger built-in electric field caused by heavier doping concentration in p-type layer. On the other hand, we grew different characteristic ITO thin film by controlling the process parameters in Radio Frequency (RF) Sputtering system, argon flow, oxygen flow and ambient pressure. Also, we employed these ITO thin films on photodetector to lower the dark current and investigate on the relationship between them. Here, we have demonstrated a Ge-on-Si photodetector with ITO layer and its performance is dark current of 0.12 μA at -3 V bias, dark current density of 0.048 mA/cm2.
author2 Jenq-Yang Chang
author_facet Jenq-Yang Chang
Lu-Tzu Liu
劉律慈
author Lu-Tzu Liu
劉律慈
spellingShingle Lu-Tzu Liu
劉律慈
Effects of P-Type Layer and Transparent Conducting Oxides Film on Ge-on-Si Photodetector
author_sort Lu-Tzu Liu
title Effects of P-Type Layer and Transparent Conducting Oxides Film on Ge-on-Si Photodetector
title_short Effects of P-Type Layer and Transparent Conducting Oxides Film on Ge-on-Si Photodetector
title_full Effects of P-Type Layer and Transparent Conducting Oxides Film on Ge-on-Si Photodetector
title_fullStr Effects of P-Type Layer and Transparent Conducting Oxides Film on Ge-on-Si Photodetector
title_full_unstemmed Effects of P-Type Layer and Transparent Conducting Oxides Film on Ge-on-Si Photodetector
title_sort effects of p-type layer and transparent conducting oxides film on ge-on-si photodetector
publishDate 2016
url http://ndltd.ncl.edu.tw/handle/8vczvc
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