Improved Cleaning Process of Al Metal Line
碩士 === 國立交通大學 === 工學院半導體材料與製程設備學程 === 104 === This paper is mainly investigate DSP clean acid , the DSP clean is a single wafer clean process .Adding a wafer rinse step before chemical DSP (Diluted Sulfuric Acid and Peroxide Mixture) direct dispensing can effectively eliminate the instant ESD (Elect...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2016
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| Online Access: | http://ndltd.ncl.edu.tw/handle/57egc8 |