Growth and Characteristics of Silicon Nitride on Gallium Nitride by Plasma-Assisted Molecular Beam Epitaxy
碩士 === 國立交通大學 === 電子物理系所 === 104 === In this dissertation, the gallium nitride and silicon nitride grown on c-plane sapphire substrate by plasma assisted molecular beam epitaxy (MBE) were studied. The photoluminescence (PL), scanning electron microscope (SEM) and X-ray photoelectron spectroscopy (XP...
Main Authors: | Wang,Jing, 王菁 |
---|---|
Other Authors: | Chou, Wu-Ching |
Format: | Others |
Language: | zh-TW |
Published: |
2016
|
Online Access: | http://ndltd.ncl.edu.tw/handle/07294005973216839348 |
Similar Items
-
The growth of gallium nitride on Si(111) by Plasma-Assisted Molecular Beam Epitaxy
by: Wen-Han Liang, et al.
Published: (2015) -
The Growth of Gallium Nitride on SiC Substrates by Plasma Assisted Molecular Beam Epitaxy
by: IWAN SUSANTO, et al.
Published: (2018) -
The growth of boron nitride by Plasma-Assisted Molecular Beam Epitaxy
by: Wei-Cyuan Huang, et al.
Published: (2019) -
Molecular beam epitaxy growth of indium nitride and indium gallium nitride materials for photovoltaic applications
by: Trybus, Elaissa Lee
Published: (2009) -
Substrate preparation for the growth of gallium nitride semiconductors by molecular beam epitaxy
by: Kropewnicki, Thomas Joseph
Published: (2006)