The study of in-situ Hydrogen Plasma Treatment on IGZO active layer of TFTs with Atmospheric Pressure-PECVD
碩士 === 國立交通大學 === 電子工程學系 電子研究所 === 104 === Conventional thin film transistor suffered from high threshold voltage, poor subthreshold swing, high operation voltage. These shortcomings make the traditional thin film transistor does not comply with the high-performance, high-resolution, low temperature...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2015
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| Online Access: | http://ndltd.ncl.edu.tw/handle/7w7w8f |