Investigation on UV-assisted thermal treatment of SiCxNy Thin Films
碩士 === 國立交通大學 === 材料科學與工程學系所 === 104 === As the feature size of VLSI devices scaling down, a lower dielectric constant both in the interlayer dielectric (ILD) and etch-stop/diffusion barrier (ES/DB) layer is necessitated to slow down the increasing trend of RC propagation delay in the backend interc...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2015
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/75112129637199929706 |