Modeling and Simulation of GeSn-based Field Effect Transistors
碩士 === 國立成功大學 === 奈米積體電路工程碩士學位學程 === 104 === Modeling and Simulation of GeSn-based Field Effect Transistors Jen-Hong Liao* Kuo-Hsing Kao** MS Degree program on Nano-Integrated Circuit Engineering, National Cheng Kung University Abstract Tunnel field-effect transistors have the potential to...
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ndltd-TW-104NCKU57950022019-05-15T22:54:09Z http://ndltd.ncl.edu.tw/handle/u5d333 Modeling and Simulation of GeSn-based Field Effect Transistors 鍺錫場效電晶體之物理模型與元件模擬 Jen-HongLiao 廖仁宏 碩士 國立成功大學 奈米積體電路工程碩士學位學程 104 Modeling and Simulation of GeSn-based Field Effect Transistors Jen-Hong Liao* Kuo-Hsing Kao** MS Degree program on Nano-Integrated Circuit Engineering, National Cheng Kung University Abstract Tunnel field-effect transistors have the potential to overcome the subthreshold slope limit of the conventional metal-oxide-semiconductor field effect transistors at room temperature. They allow to further scale down the supply voltage, threshold voltage and power consumption of the integrated circuits. The one of the main challenges of group-IV-based TFETs is the unsatisfactory on-current due to the phonon-assisted tunneling through the large indirect bandgaps. This article is devoted to discuss the direct and indirect band-to-band tunneling in group-IV semiconductors. Although Ge and SiGe possess smaller bandgaps and lighter carrier effective masses, theoretical and experimental result still unsatisfactory improvement. To further enhance the TFET performance, exploitation of direct BTBT in group-IV semiconductors is a promising approach. GeSn has emerged as a promising alternative alloy to achieve tunable direct bandgap among group IV materials. By increasing the Sn concentration, the bandgaps of relaxed GeSn alloys exhibit a transition from indirect to direct. In addition, GeSn possess smaller bandgaps and lighter carrier effective masses than Ge. In this dissertation, I will discuss GeSn-based Field Effect TransistorsIn this study we utilize 8-k·p model to calculate GeSn energy bandgap and effective mass. In addition we also explore GeSn physical property which consider nonparabolicity, multi-valley and quantum size confinement. At last, by using TCAD to simulate and compare GeSn-based property which include TFETs, PNIN TFETs and MOSFET devices. *Author **Advisor Keywords: MOSFET、CMOS、Tunnel FET、subthreshold slope SS、Germanium tin Kuo-Hsing Kao 高國興 2016 學位論文 ; thesis 40 en_US |
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碩士 === 國立成功大學 === 奈米積體電路工程碩士學位學程 === 104 === Modeling and Simulation of GeSn-based Field Effect Transistors
Jen-Hong Liao* Kuo-Hsing Kao**
MS Degree program on Nano-Integrated Circuit Engineering,
National Cheng Kung University
Abstract
Tunnel field-effect transistors have the potential to overcome the subthreshold slope limit of the conventional metal-oxide-semiconductor field effect transistors at room temperature. They allow to further scale down the supply voltage, threshold voltage and power consumption of the integrated circuits. The one of the main challenges of group-IV-based TFETs is the unsatisfactory on-current due to the phonon-assisted tunneling through the large indirect bandgaps. This article is devoted to discuss the direct and indirect band-to-band tunneling in group-IV semiconductors.
Although Ge and SiGe possess smaller bandgaps and lighter carrier effective masses, theoretical and experimental result still unsatisfactory improvement. To further enhance the TFET performance, exploitation of direct BTBT in group-IV semiconductors is a promising approach. GeSn has emerged as a promising alternative alloy to achieve tunable direct bandgap among group IV materials. By increasing the Sn concentration, the bandgaps of relaxed GeSn alloys exhibit a transition from indirect to direct. In addition, GeSn possess smaller bandgaps and lighter carrier effective masses than Ge. In this dissertation, I will discuss GeSn-based Field Effect TransistorsIn this study we utilize 8-k·p model to calculate GeSn energy bandgap and effective mass. In addition we also explore GeSn physical property which consider nonparabolicity, multi-valley and quantum size confinement. At last, by using TCAD to simulate and compare GeSn-based property which include TFETs, PNIN TFETs and MOSFET devices.
*Author **Advisor
Keywords: MOSFET、CMOS、Tunnel FET、subthreshold slope SS、Germanium tin
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author2 |
Kuo-Hsing Kao |
author_facet |
Kuo-Hsing Kao Jen-HongLiao 廖仁宏 |
author |
Jen-HongLiao 廖仁宏 |
spellingShingle |
Jen-HongLiao 廖仁宏 Modeling and Simulation of GeSn-based Field Effect Transistors |
author_sort |
Jen-HongLiao |
title |
Modeling and Simulation of GeSn-based Field Effect Transistors |
title_short |
Modeling and Simulation of GeSn-based Field Effect Transistors |
title_full |
Modeling and Simulation of GeSn-based Field Effect Transistors |
title_fullStr |
Modeling and Simulation of GeSn-based Field Effect Transistors |
title_full_unstemmed |
Modeling and Simulation of GeSn-based Field Effect Transistors |
title_sort |
modeling and simulation of gesn-based field effect transistors |
publishDate |
2016 |
url |
http://ndltd.ncl.edu.tw/handle/u5d333 |
work_keys_str_mv |
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