Investigation on the photoelectronic characteristics of Zn1-xSnxO nanocrystaline films
碩士 === 國立中興大學 === 電機工程學系所 === 104 === In this thesis we employed sol-gel spin coating method to fabricate Zn1-xSnxO films on the silicon substrates. The experiment used different Sn mole ratio x (0, 0.02, 0.04, 0.06) and various sintering temperature (500 ℃, 600 ℃, 700 ℃), respectively. The purpose...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2016
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| Online Access: | http://ndltd.ncl.edu.tw/handle/70316231585692285921 |