Optimization of the Thin Film Thickness for MEMS Pressure Sensor Using Taguchi Methods

碩士 === 明新科技大學 === 機械工程系精密機電工程碩士在職專班 === 103 === With the rising road safety awareness, tire pressure detection using MEMS pressure sensor becomes more and more popular. The thin film technology MEMS pressure sensor could adapt in bad environments including high-temperature and corrosive conditions....

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Bibliographic Details
Main Authors: Hsieh Pang Chen, 謝邦忱
Other Authors: Chin -An Wang
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/87913356566223019836
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Summary:碩士 === 明新科技大學 === 機械工程系精密機電工程碩士在職專班 === 103 === With the rising road safety awareness, tire pressure detection using MEMS pressure sensor becomes more and more popular. The thin film technology MEMS pressure sensor could adapt in bad environments including high-temperature and corrosive conditions. MEMS pressure sensor market has increased rapidly. In order to improve the company's revenue, the MEMS pressure sensor manufacturers are all devoted to improve the existing product yield. Tire pressure is measured according to the deformation of MEMS thin film resulting in an electronic signal during driving. Therefore, the thickness of the MEMS thin film plays the most important role for the sensor. In this study, Taguchi methods were used to optimize the parameters for thin film manufacturing. The optimized processes effectively reduce the defect ratio caused by inhomogeneous of thin film thickness from 1.96% to 0.6%. Keywords:MEMS, Pressure sensor, Taguchi methods, yield