Low resistance and high transparent molybdenum trioxide olybdenum trioxide olybdenum trioxide olybdenum trioxide olybdenum trioxide films with an embedded Ag layer by sputtering

碩士 === 明新科技大學 === 化學工程與材料科技系碩士在職專班 === 104 === The transparent conductive electrode (TCE) shows high visibility within the wavelength ranging from 400 to 700 nm and low resistance. The films can be used in the transparent electrode in liquid crystal display, touch panel, electromagnetic wave shield...

Full description

Bibliographic Details
Main Authors: CHIU,SU-CHING, 邱素卿
Other Authors: CHEN,PANG-SHIU
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/44765990310304663959
id ndltd-TW-104MHIT1063010
record_format oai_dc
spelling ndltd-TW-104MHIT10630102017-10-15T04:37:20Z http://ndltd.ncl.edu.tw/handle/44765990310304663959 Low resistance and high transparent molybdenum trioxide olybdenum trioxide olybdenum trioxide olybdenum trioxide olybdenum trioxide films with an embedded Ag layer by sputtering 使用濺鍍系統製備低電阻高透光度 氧化鉬與銀的複合薄膜 CHIU,SU-CHING 邱素卿 碩士 明新科技大學 化學工程與材料科技系碩士在職專班 104 The transparent conductive electrode (TCE) shows high visibility within the wavelength ranging from 400 to 700 nm and low resistance. The films can be used in the transparent electrode in liquid crystal display, touch panel, electromagnetic wave shield and solar cell. Transition metal oxide were adopted in the application of TCE. However, high process temperature was required to activate the dopants in transition metal oxide. (TMO) Hence, some studies were pursuit a low temperature process, especially for flexible electronics. Among the TMO, MoOx can be used in cathode of organic light emitting diode, due to its high work function. With O2 and Ar mixture, the MoOx can be prepared with high visible transmittance. In this study, we used sputtering system to explore the MoOx-metal- MoOx, metal- MoOx and MoOx-metal multilayers. Ag was the inserted metal layer, and glass was substrate. After preparation, we used Atomic Force Microscope to obtain surface roughness and observe surface topography, the optical properties of the stacking layers were Hall-effect measurement for electrical property and the surface morphology of MAM examined by UV/Vis/NIR observed the surface topography and film thickness by scanning electron microscope. The multilayer, it showed a very high transmittance in visible region and a low resistance by inserting Ag into the MoOx layers. The optical property of MAM multilayer depends on the Ag in thickness. 10 nm Ag with a DC power of 30W and 30nm stacked MoOx by RF power of 150W, the transmittance can reaches as high as 87%. Under 30-nm stacked MoOx layers, resistance is 4.8 ohm/sq and figure of merit (FOM) is 5×10-2 ohm-1 at the wavelength of 550nm. The thickness of MoOx will influence the peak transmission of MAM stacked layer. CHEN,PANG-SHIU 陳邦旭 2016 學位論文 ; thesis 74 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 明新科技大學 === 化學工程與材料科技系碩士在職專班 === 104 === The transparent conductive electrode (TCE) shows high visibility within the wavelength ranging from 400 to 700 nm and low resistance. The films can be used in the transparent electrode in liquid crystal display, touch panel, electromagnetic wave shield and solar cell. Transition metal oxide were adopted in the application of TCE. However, high process temperature was required to activate the dopants in transition metal oxide. (TMO) Hence, some studies were pursuit a low temperature process, especially for flexible electronics. Among the TMO, MoOx can be used in cathode of organic light emitting diode, due to its high work function. With O2 and Ar mixture, the MoOx can be prepared with high visible transmittance. In this study, we used sputtering system to explore the MoOx-metal- MoOx, metal- MoOx and MoOx-metal multilayers. Ag was the inserted metal layer, and glass was substrate. After preparation, we used Atomic Force Microscope to obtain surface roughness and observe surface topography, the optical properties of the stacking layers were Hall-effect measurement for electrical property and the surface morphology of MAM examined by UV/Vis/NIR observed the surface topography and film thickness by scanning electron microscope. The multilayer, it showed a very high transmittance in visible region and a low resistance by inserting Ag into the MoOx layers. The optical property of MAM multilayer depends on the Ag in thickness. 10 nm Ag with a DC power of 30W and 30nm stacked MoOx by RF power of 150W, the transmittance can reaches as high as 87%. Under 30-nm stacked MoOx layers, resistance is 4.8 ohm/sq and figure of merit (FOM) is 5×10-2 ohm-1 at the wavelength of 550nm. The thickness of MoOx will influence the peak transmission of MAM stacked layer.
author2 CHEN,PANG-SHIU
author_facet CHEN,PANG-SHIU
CHIU,SU-CHING
邱素卿
author CHIU,SU-CHING
邱素卿
spellingShingle CHIU,SU-CHING
邱素卿
Low resistance and high transparent molybdenum trioxide olybdenum trioxide olybdenum trioxide olybdenum trioxide olybdenum trioxide films with an embedded Ag layer by sputtering
author_sort CHIU,SU-CHING
title Low resistance and high transparent molybdenum trioxide olybdenum trioxide olybdenum trioxide olybdenum trioxide olybdenum trioxide films with an embedded Ag layer by sputtering
title_short Low resistance and high transparent molybdenum trioxide olybdenum trioxide olybdenum trioxide olybdenum trioxide olybdenum trioxide films with an embedded Ag layer by sputtering
title_full Low resistance and high transparent molybdenum trioxide olybdenum trioxide olybdenum trioxide olybdenum trioxide olybdenum trioxide films with an embedded Ag layer by sputtering
title_fullStr Low resistance and high transparent molybdenum trioxide olybdenum trioxide olybdenum trioxide olybdenum trioxide olybdenum trioxide films with an embedded Ag layer by sputtering
title_full_unstemmed Low resistance and high transparent molybdenum trioxide olybdenum trioxide olybdenum trioxide olybdenum trioxide olybdenum trioxide films with an embedded Ag layer by sputtering
title_sort low resistance and high transparent molybdenum trioxide olybdenum trioxide olybdenum trioxide olybdenum trioxide olybdenum trioxide films with an embedded ag layer by sputtering
publishDate 2016
url http://ndltd.ncl.edu.tw/handle/44765990310304663959
work_keys_str_mv AT chiusuching lowresistanceandhightransparentmolybdenumtrioxideolybdenumtrioxideolybdenumtrioxideolybdenumtrioxideolybdenumtrioxidefilmswithanembeddedaglayerbysputtering
AT qiūsùqīng lowresistanceandhightransparentmolybdenumtrioxideolybdenumtrioxideolybdenumtrioxideolybdenumtrioxideolybdenumtrioxidefilmswithanembeddedaglayerbysputtering
AT chiusuching shǐyòngjiàndùxìtǒngzhìbèidīdiànzǔgāotòuguāngdùyǎnghuàmùyǔyíndefùhébáomó
AT qiūsùqīng shǐyòngjiàndùxìtǒngzhìbèidīdiànzǔgāotòuguāngdùyǎnghuàmùyǔyíndefùhébáomó
_version_ 1718555071970541568