Analysis & Improvement Defect of Spin Coater on The VLSI Lithography Process
碩士 === 國立高雄應用科技大學 === 機械與精密工程研究所 === 104 === The study explores and analyzes the procedure of semiconductor manufacturing, particularly on the defections found during photoresist coating, and how to prevent it from happening. The first part of study identifies the pro & con of different types of...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2016
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| Online Access: | http://ndltd.ncl.edu.tw/handle/d3bw5x |