Using Six Sigma to Improve Uniformity for Chemical Vapor Deposition in Semiconductor Manufacturing Process

碩士 === 逢甲大學 === 工業工程與系統管理學系 === 104

Bibliographic Details
Main Authors:	Chia-Liang Hung, 洪嘉良
Other Authors:	蕭堯仁
Format:	Others
Language:	zh-TW
Published:	2016
Online Access:	http://ndltd.ncl.edu.tw/handle/85668524949934892659

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spelling	ndltd-TW-104FCU050310052016-04-02T04:07:22Z http://ndltd.ncl.edu.tw/handle/85668524949934892659 Using Six Sigma to Improve Uniformity for Chemical Vapor Deposition in Semiconductor Manufacturing Process 運用六標準差於半導體製程化學氣相沈積能力之均勻度改善 Chia-Liang Hung 洪嘉良碩士逢甲大學工業工程與系統管理學系 104 蕭堯仁 2016 學位論文 ; thesis 71 zh-TW
collection	NDLTD
language	zh-TW
format	Others
sources	NDLTD
description	碩士 === 逢甲大學 === 工業工程與系統管理學系 === 104
author2	蕭堯仁
author_facet	蕭堯仁 Chia-Liang Hung 洪嘉良
author	Chia-Liang Hung 洪嘉良
spellingShingle	Chia-Liang Hung 洪嘉良 Using Six Sigma to Improve Uniformity for Chemical Vapor Deposition in Semiconductor Manufacturing Process
author_sort	Chia-Liang Hung
title	Using Six Sigma to Improve Uniformity for Chemical Vapor Deposition in Semiconductor Manufacturing Process
title_short	Using Six Sigma to Improve Uniformity for Chemical Vapor Deposition in Semiconductor Manufacturing Process
title_full	Using Six Sigma to Improve Uniformity for Chemical Vapor Deposition in Semiconductor Manufacturing Process
title_fullStr	Using Six Sigma to Improve Uniformity for Chemical Vapor Deposition in Semiconductor Manufacturing Process
title_full_unstemmed	Using Six Sigma to Improve Uniformity for Chemical Vapor Deposition in Semiconductor Manufacturing Process
title_sort	using six sigma to improve uniformity for chemical vapor deposition in semiconductor manufacturing process
publishDate	2016
url	http://ndltd.ncl.edu.tw/handle/85668524949934892659
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Using Six Sigma to Improve Uniformity for Chemical Vapor Deposition in Semiconductor Manufacturing Process

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