Study on a quality issue of a chemical process-removal of micro particles in the chemical''s supply pipe-

碩士 === 中原大學 === 工業與系統工程研究所 === 104 === Abstract Advanced semiconductor process technology and innovation continuously, from the recent 45-nm to 28 nm, has been and even more to break through to 10 nm, and to do high-performance and low-power mobile computing processes the ability to provide a wide r...

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Bibliographic Details
Main Authors: Zi-Qian Chen, 陳子謙
Other Authors: Kang-hung Yang
Format: Others
Language:zh-TW
Published: 2016
Online Access:http://ndltd.ncl.edu.tw/handle/sbnp4g
Description
Summary:碩士 === 中原大學 === 工業與系統工程研究所 === 104 === Abstract Advanced semiconductor process technology and innovation continuously, from the recent 45-nm to 28 nm, has been and even more to break through to 10 nm, and to do high-performance and low-power mobile computing processes the ability to provide a wide range of customization process capability, so in order to maintain the advanced process capabilities continue to maintain a leading position, Can be seen from Intel and TSMC under mutual rivalry. The factory high-quality in central supply chemical system as research, in addition to raw materials needed by the QC department to check, factory quality control services in central supply chemical materials will have an impact, this research through pre-cleaning chemical pipe reduce the supply pipe of raw materials to the production line of particles, reducing the use of raw materials to do the amount of flushing the pipeline, thereby reducing material cost saving reduction. Advanced process always needs through constant trial and test, Can be through experiments and research analysis has different results, I hope to further enhance the professional capabilities of self, and then bring out the different innovative thinking Keyword:VMB(Valve Manifold Box)、Particle counter、Piping clean machine