The effect of boron dopant on the oxidation temperature and wear resistance of diamond film
碩士 === 國立臺北科技大學 === 材料科學與工程研究所 === 103 === The purpose of this study was to prepare boron-doped diamond thin film by Hot Filament Chemical Vapor Deposition (HFCVD). During deposition, one evaporating dish was introduced into the system and boron oxide powders were used as source of the boron dopant....
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/cgi-bin/gs32/gsweb.cgi/login?o=dnclcdr&s=id=%22103TIT05159054%22.&searchmode=basic |