The study of Ta-Zr-Cu Ternary Thin Film Metallic Glass Fabricated by Single Ta Target Sputter Method

• Main Authors: Chen,Ming-Hong, 陳明弘
• Other Authors: Wang,Shea-Jue
• Language: zh-TW
• Online Access: http://ndltd.ncl.edu.tw/handle/8986ap

碩士 === 國立臺北科技大學 === 材料科學與工程研究所 === 103 === Ta-Zr-Cu thin film metallic glasses(TFMGs) fabricated by placing the copper(Cu) and zirconium(Zr) metal plates on the tantalum(Ta) target to single target magnetron co-sputter. The thin films’ composition can be changed by changing the metal plates’ number. In the first part(TxZ8-xC1), the Cu’s area is constant, just adjusted the metal area of Ta and Zr. The thin films’ XRD pattern shows the diffused broad hump. The average roughness(Ra) was between 0.201 to 0.270 nm, and T6Z2C1 has the highest hardness reached 10.58 GPa. In the second part(T3ZxC8-x), the Ta’s area is constant, just adjust the metal area of Cu and Zr. The thin films’ XRD pattern shows the diffused broad hump, expect for T3Z1C5 appears the Cu crystalline peaks (111) and (200). T3Z4C2 has the best Ra in this part, only 0.282 nm. Thin films’ hardness decrease from 10.57 to 5.90 GPa with the increasing Cu content. In the third part(TxZ1C8-x), the Zr’s area is constant, just adjusted the metal area of Ta and Cu. The thin films’ XRD pattern shows the diffused broad hump, expect for T4Z1C4 appears the Cu crystalline peaks (111) and (200). This part’s Ra and hardness are worse than other two parts. T6Z1C2 has the best Ra and the best hardness is 0.878 nm and 8.90 Gpa, respectively in this part.