A Novel Sub-micron Bubble Generator and the Observation of the Generated Bubble

• Main Authors: Chang-Yi Yu, 游承逸
• Other Authors: I-Kuan Yang
• Format: Others
• Language: zh-TW
• Published: 2015
• Online Access: http://ndltd.ncl.edu.tw/handle/41539768585263549548

碩士 === 東海大學 === 化學工程與材料工程學系 === 103 === The main purpose of this research is to design a system and construct an apparatus to generate submicron bubbles by the combination of submicron channeled silicon wafers and a high-speed rotator, and to investigate the diameter variation of submicron bubbles generated at different circumstances. The research divides into two parts：One is about the preparation of the silicon wafers and the other is about the size of the bubbles from the generator. Bubbles of submicron size are expected to be generated by the combination and the evolution of the bubble size is also discussed. In the preparation of the silicon wafers, photolithography and wet- etching process were applied to realize the submicron channels by the balance between mechanical strength and porosity. Comparatively, wet-etching is more cost effective to produce channels in the wafers. Potassium hydroxide was the key component of the etchant. Periodic examinations of the etched depth and the size of pattern scanning electron microscopy and alpha-stepper helped to capture the etching time with exact precision. With the addition of surfactant, the bubble generator is used to produce submicron bubbles of various sizes and the dependence of the size on the speed of the rotor and the concentration of surfactant were studied in accompany with the evolution of the bubble size of increasing age