First Principles Modeling and Simulations of the Structural, Electronic, Dielectric, and Mechanical Properties of the High-κ and Low-κ Dielectric Materials
博士 === 國立臺灣大學 === 材料科學與工程學研究所 === 103 === With the continued down-scaling of the integrated circuits, the conventional dielectric oxide, SiO2, have been replaced by new dielectric materials, such as the high-κ oxides in CMOS transistors to avoid excess leakage current and the low-κ silicate insulati...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2014
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/r2pt7x |