Hybrid Lithography Optimization with DSA and E-beam for 1D Gridded Layout
碩士 === 國立清華大學 === 資訊工程學系 === 103 === As the integrated circuit industry continues to scale down the minimun feature size, design style is moving from complex 2D design to highly regular 1D design with the "lines and cuts" process. While dense lines can be fully optimized by their regularit...
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| Format: | Others |
| Language: | en_US |
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2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/34445087566108858225 |