Direct-Writing Cu Nano-Pattern with Electron Beam
碩士 === 國立清華大學 === 材料科學工程學系 === 103 === The electron beam (e-beam) was utilized to direct-writing nano-scale Cu patterns on a surface with a thin aqueous layer of CuSO4 solution, through the reaction of Cu2+ + 2e- → Cu. A transmission electron microscopy (TEM, model: JEOL JEM 2010) served as the e-be...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2015
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| Online Access: | http://ndltd.ncl.edu.tw/handle/tc7425 |