Directed Self-Assembly of Block Copolymer on Topographic Nanopatterns by Solvent Annealing

碩士 === 國立清華大學 === 化學工程學系 === 103 === The fabrication of nanostructured thin films from the self-assembly of degradable block copolymers (BCPs) has attracted extensive attention in the past decade, and a variety of appealing applications in different research areas have been suggested by using the na...

Full description

Bibliographic Details
Main Authors: Chi, Kuan Hsiung, 齊冠雄
Other Authors: Ho, Rong Ming
Format: Others
Language:en_US
Published: 2015
Online Access:http://ndltd.ncl.edu.tw/handle/42094895432564402262