Complementary electrochromic device using metal grid electrode structure
碩士 === 國立中山大學 === 電機工程學系研究所 === 103 === In this study, the electrodes for the complementary electrochromic device (CECD) were fabricated using cooper, nickel-vanadium and tungsten by pulsed-DC sputtering deposite on and formed the metal grid structure by self-made mask. Then, the electrochromic film...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2015
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/nmc68b |