Field-Driven Domain Wall Motion in Notch-Patterned Permalloy Nanowire Devices

碩士 === 國立彰化師範大學 === 物理學系 === 103 === Based on the current advancement of information fast electronic processing speed and ultra-high storage capacity are needed. Recently, the development of Spintronics has given promising applications in the fields of logic processing and data storage/memory. The...

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Main Authors: Pei-Chu Tsai, 蔡珮渠
Other Authors: Jong-Ching Wu
Format: Others
Language:zh-TW
Online Access:http://ndltd.ncl.edu.tw/handle/77097749539620611958
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spelling ndltd-TW-103NCUE51980122016-07-31T04:22:37Z http://ndltd.ncl.edu.tw/handle/77097749539620611958 Field-Driven Domain Wall Motion in Notch-Patterned Permalloy Nanowire Devices 磁場驅動磁區壁在具三角缺陷之鎳鐵奈米線中的移動行為 Pei-Chu Tsai 蔡珮渠 碩士 國立彰化師範大學 物理學系 103 Based on the current advancement of information fast electronic processing speed and ultra-high storage capacity are needed. Recently, the development of Spintronics has given promising applications in the fields of logic processing and data storage/memory. Therefore, many efforts have been devoted to investigate the relevant issues such as magnetic domain wall (DW) motion in magnetic nanowires (NWs). In this thesis, the formation and propagation of magnetic domain walls in ferromagnetic nanowires are presented. Nanometer Permalloy wires with one end connected with a micron circular pad and the other end sharpened are fabricated along with alternative upward/downward triangular notches. The micron circular pad is acting as domain wall launching pad, sharpened end is made to prevent domain wall nucleation, and notches are designed to be the pinning sites. In such a design, the pinning and depinning of the magnetic domain walls may be observed by an applying external magnetic field along the nanowires. The planar Permalloy nanowires with various widths of 350, 500 and 550 nm are fabricated on Si/SiO2 substrate by using standard electron beam lithography through a lift-off process. The Permalloy was thermally evaporated with thickness being controlled to be around 25 to 30 nm. The lengths of the nanowires are tens of micrometers, and the depths of triangular notches are nearly half of the nanowire’s widths. The dynamics of the domain walls has been investigated by an in-situ magnetic force microscopy (MFM). The MFM micrographs are taken in the presence of continuous and pulsed in-plane magnetic field applied along the long axes of the wires. In addition, micromagnetic simulations using both OOMMF and MuMax3 are carried out to analyze the propagation behavior of the domain walls through the Permalloy nanowires. The experimental results show the domain wall nucleates from the circular pad and propagates along the nanowire. Under the continuous magnetic field, the domain walls are only pinned at the first or at the second notch followed by DW propagation to the other end of the NWs and thus the reversal processes are finished. In case of pulsed magnetic field, repeated measurements occasionally show the domain walls are pinned at different locations in the different runs. Furthermore, the domain walls are pinned at many notches in the nanowires with smaller widths. Therefore, by using the pulsed field with different duration, number of times, and magnitude of field can control the location of DW in the nanowires. Jong-Ching Wu 吳仲卿 學位論文 ; thesis 79 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立彰化師範大學 === 物理學系 === 103 === Based on the current advancement of information fast electronic processing speed and ultra-high storage capacity are needed. Recently, the development of Spintronics has given promising applications in the fields of logic processing and data storage/memory. Therefore, many efforts have been devoted to investigate the relevant issues such as magnetic domain wall (DW) motion in magnetic nanowires (NWs). In this thesis, the formation and propagation of magnetic domain walls in ferromagnetic nanowires are presented. Nanometer Permalloy wires with one end connected with a micron circular pad and the other end sharpened are fabricated along with alternative upward/downward triangular notches. The micron circular pad is acting as domain wall launching pad, sharpened end is made to prevent domain wall nucleation, and notches are designed to be the pinning sites. In such a design, the pinning and depinning of the magnetic domain walls may be observed by an applying external magnetic field along the nanowires. The planar Permalloy nanowires with various widths of 350, 500 and 550 nm are fabricated on Si/SiO2 substrate by using standard electron beam lithography through a lift-off process. The Permalloy was thermally evaporated with thickness being controlled to be around 25 to 30 nm. The lengths of the nanowires are tens of micrometers, and the depths of triangular notches are nearly half of the nanowire’s widths. The dynamics of the domain walls has been investigated by an in-situ magnetic force microscopy (MFM). The MFM micrographs are taken in the presence of continuous and pulsed in-plane magnetic field applied along the long axes of the wires. In addition, micromagnetic simulations using both OOMMF and MuMax3 are carried out to analyze the propagation behavior of the domain walls through the Permalloy nanowires. The experimental results show the domain wall nucleates from the circular pad and propagates along the nanowire. Under the continuous magnetic field, the domain walls are only pinned at the first or at the second notch followed by DW propagation to the other end of the NWs and thus the reversal processes are finished. In case of pulsed magnetic field, repeated measurements occasionally show the domain walls are pinned at different locations in the different runs. Furthermore, the domain walls are pinned at many notches in the nanowires with smaller widths. Therefore, by using the pulsed field with different duration, number of times, and magnitude of field can control the location of DW in the nanowires.
author2 Jong-Ching Wu
author_facet Jong-Ching Wu
Pei-Chu Tsai
蔡珮渠
author Pei-Chu Tsai
蔡珮渠
spellingShingle Pei-Chu Tsai
蔡珮渠
Field-Driven Domain Wall Motion in Notch-Patterned Permalloy Nanowire Devices
author_sort Pei-Chu Tsai
title Field-Driven Domain Wall Motion in Notch-Patterned Permalloy Nanowire Devices
title_short Field-Driven Domain Wall Motion in Notch-Patterned Permalloy Nanowire Devices
title_full Field-Driven Domain Wall Motion in Notch-Patterned Permalloy Nanowire Devices
title_fullStr Field-Driven Domain Wall Motion in Notch-Patterned Permalloy Nanowire Devices
title_full_unstemmed Field-Driven Domain Wall Motion in Notch-Patterned Permalloy Nanowire Devices
title_sort field-driven domain wall motion in notch-patterned permalloy nanowire devices
url http://ndltd.ncl.edu.tw/handle/77097749539620611958
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