Reliable Charge Trapping Non-volatile Memory by Plasma Enhanced atomic layer deposition-fabricated band-gap engineered gate structures

碩士 === 國立交通大學 === 光電工程研究所 === 103 === Recent trends of scaling have led to prosperity of embedded application. Non-volatile memory, featuring stored information can be retained in the absence of power, has become a promising alternative for conventional DRAM. With high-K dielectrics introduced, reli...

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Bibliographic Details
Main Authors: Chen, Chiu-Hao, 陳秋豪
Other Authors: Huang, Jung-Yao
Format: Others
Language:en_US
Published: 2015
Online Access:http://ndltd.ncl.edu.tw/handle/61271280110673764216

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