Influence of Annealing on The Properties of Tin Oxide Films Deposited at Low RF Power
碩士 === 國立暨南國際大學 === 應用材料及光電工程學系 === 103 === Tin oxide exists in two forms of stannous oxide/tin monoxide (SnO) and stannic oxide/tin dioxide (SnO2). There are few reports on its formation of single phase and/or growth of epitaxial/oriented thin film. The SnO films are deposited at low RF power using...
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2015
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| Online Access: | http://ndltd.ncl.edu.tw/handle/thfmqb |
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ndltd-TW-103NCNU01240102019-05-15T22:08:05Z http://ndltd.ncl.edu.tw/handle/thfmqb Influence of Annealing on The Properties of Tin Oxide Films Deposited at Low RF Power 退火對低射頻功率所沈積的氧化錫薄膜特性之影響 Sheng-You Fan 范盛囿 碩士 國立暨南國際大學 應用材料及光電工程學系 103 Tin oxide exists in two forms of stannous oxide/tin monoxide (SnO) and stannic oxide/tin dioxide (SnO2). There are few reports on its formation of single phase and/or growth of epitaxial/oriented thin film. The SnO films are deposited at low RF power using RF magnetron sputtering in this study. Then, annealing is applied to improve the properties of SnO films. Increasing the annealing temperature results in the coexistence of orthorhombic SnO and tetragonal SnO2. At a higher annealing temperature or lower gas flow rate of nitrogen, the tin oxide films show lower surface roughness and higher visible transmission. Su-Shia Lin 林素霞 2015 學位論文 ; thesis 36 zh-TW |
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碩士 === 國立暨南國際大學 === 應用材料及光電工程學系 === 103 === Tin oxide exists in two forms of stannous oxide/tin monoxide (SnO) and stannic oxide/tin dioxide (SnO2). There are few reports on its formation of single phase and/or growth of epitaxial/oriented thin film. The SnO films are deposited at low RF power using RF magnetron sputtering in this study. Then, annealing is applied to improve the properties of SnO films. Increasing the annealing temperature results in the coexistence of orthorhombic SnO and tetragonal SnO2. At a higher annealing temperature or lower gas flow rate of nitrogen, the tin oxide films show lower surface roughness and higher visible transmission.
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| author2 |
Su-Shia Lin |
| author_facet |
Su-Shia Lin Sheng-You Fan 范盛囿 |
| author |
Sheng-You Fan 范盛囿 |
| spellingShingle |
Sheng-You Fan 范盛囿 Influence of Annealing on The Properties of Tin Oxide Films Deposited at Low RF Power |
| author_sort |
Sheng-You Fan |
| title |
Influence of Annealing on The Properties of Tin Oxide Films Deposited at Low RF Power |
| title_short |
Influence of Annealing on The Properties of Tin Oxide Films Deposited at Low RF Power |
| title_full |
Influence of Annealing on The Properties of Tin Oxide Films Deposited at Low RF Power |
| title_fullStr |
Influence of Annealing on The Properties of Tin Oxide Films Deposited at Low RF Power |
| title_full_unstemmed |
Influence of Annealing on The Properties of Tin Oxide Films Deposited at Low RF Power |
| title_sort |
influence of annealing on the properties of tin oxide films deposited at low rf power |
| publishDate |
2015 |
| url |
http://ndltd.ncl.edu.tw/handle/thfmqb |
| work_keys_str_mv |
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