Design of a Respiration Detection Chip with DC Offset Calibration Technique
碩士 === 國立成功大學 === 電機工程學系 === 103 === To lower the death rate of infants and elders due to respiration diseases, a respiration detection system has been implemented. The system contains the MEMS cantilevered flow sensor, the signal processing circuit and the digital conversion circuit, and they are i...
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ndltd-TW-103NCKU54420062019-05-15T21:59:10Z http://ndltd.ncl.edu.tw/handle/cg4x2b Design of a Respiration Detection Chip with DC Offset Calibration Technique 具直流抵補電壓校正之呼吸感測晶片設計 Ming-KeTsai 蔡明克 碩士 國立成功大學 電機工程學系 103 To lower the death rate of infants and elders due to respiration diseases, a respiration detection system has been implemented. The system contains the MEMS cantilevered flow sensor, the signal processing circuit and the digital conversion circuit, and they are integrated into a single chip. A DC offset calibration technique has been proposed to eliminate the offset voltage caused by the MEMS cantilevered flow sensor. Two versions of MEMS cantilevered flow sensors with different designs are implemented and their sensitivities are compared. This chip was fabricated by using Taiwan Semiconductor Manufacturing Company (TSMC) 0.35μm CMOS/MEMS 2P4M 3.3V mixed-signal polycide process and MEMS post process. The die area of this chip is 1.797x 2.353 mm2. The system power consumption is 6.31 mW containing the sensor power consumption. Chia-Ling Wei 魏嘉玲 2014 學位論文 ; thesis 73 en_US |
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碩士 === 國立成功大學 === 電機工程學系 === 103 === To lower the death rate of infants and elders due to respiration diseases, a respiration detection system has been implemented. The system contains the MEMS cantilevered flow sensor, the signal processing circuit and the digital conversion circuit, and they are integrated into a single chip. A DC offset calibration technique has been proposed to eliminate the offset voltage caused by the MEMS cantilevered flow sensor. Two versions of MEMS cantilevered flow sensors with different designs are implemented and their sensitivities are compared.
This chip was fabricated by using Taiwan Semiconductor Manufacturing Company (TSMC) 0.35μm CMOS/MEMS 2P4M 3.3V mixed-signal polycide process and MEMS post process. The die area of this chip is 1.797x 2.353 mm2. The system power consumption is 6.31 mW containing the sensor power consumption.
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author2 |
Chia-Ling Wei |
author_facet |
Chia-Ling Wei Ming-KeTsai 蔡明克 |
author |
Ming-KeTsai 蔡明克 |
spellingShingle |
Ming-KeTsai 蔡明克 Design of a Respiration Detection Chip with DC Offset Calibration Technique |
author_sort |
Ming-KeTsai |
title |
Design of a Respiration Detection Chip with DC Offset Calibration Technique |
title_short |
Design of a Respiration Detection Chip with DC Offset Calibration Technique |
title_full |
Design of a Respiration Detection Chip with DC Offset Calibration Technique |
title_fullStr |
Design of a Respiration Detection Chip with DC Offset Calibration Technique |
title_full_unstemmed |
Design of a Respiration Detection Chip with DC Offset Calibration Technique |
title_sort |
design of a respiration detection chip with dc offset calibration technique |
publishDate |
2014 |
url |
http://ndltd.ncl.edu.tw/handle/cg4x2b |
work_keys_str_mv |
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