Effects of the Zr Content on the Mechanical Properties and Oxidation Resistance of Reactively Sputtered Ta1-xZrxNy Thin Films

碩士 === 明志科技大學 === 材料工程系碩士班 === 104 === Glass offers better anti-thermal, anti-environmental, corrosion resistance, and optical properties than polymer materials. Therefore, glass lens play an important role in photoelectron industry. Molding method can rapidly produce precision glass lens. In the ke...

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Bibliographic Details
Main Authors: Chang, Ching-Yan, 張清晏
Other Authors: Chang, Li-Chun
Format: Others
Language:zh-TW
Published: 2015
Online Access:http://ndltd.ncl.edu.tw/handle/cpuzau
Description
Summary:碩士 === 明志科技大學 === 材料工程系碩士班 === 104 === Glass offers better anti-thermal, anti-environmental, corrosion resistance, and optical properties than polymer materials. Therefore, glass lens play an important role in photoelectron industry. Molding method can rapidly produce precision glass lens. In the key technologies of glass molding, the die core of protective coating is indispensable. As a die core of the protection coating that must overcome the threat of high temperature oxidation. Ta1-xZrxNy coatings were fabricated by reactive direct current magnetron co-sputtering and RF + HIPIMS magnetron co-sputtering on silicon, cemented carbide and SUS420 substrates. To evaluate the potential as protective coatings on glass molding dies, the oxidation resistance of Ta1-xZrxNy coatings were evaluated by annealing the samples at 600°C in a 15 ppm O2–N2 atmosphere. Thermal cycling annealing at 270°C and 600°C, insisting at 600 ± 10°C for 1 min/cycle, was conducted in a quartz tube furnace to simulate a glass molding process in a continuous flow of 15 ppm O2–N2. Study on the effect of Zr content on the mechanical properties and oxidation resistance of Ta1-xZrxNy thin films. Ta1-xZrxNy thin films, which were prepared by reactive direct current magnetron co-sputtering, after 8 hours annealing not only contained oxygen content below 11.2 at.% also exhibited 26.8-32.3 GPa hardness and average roughness lower than 2.80 nm when percentage of Zr/(Ta+Zr) is less than 0.17. On the other hand, Ta0.58Zr0.42N0.59, which is fabricated by using RF + HIPIMS magnetron co-sputtering, still maintain a hardness of 24.8 GPa and a average roughness of 1.65 nm after 8 hours annealing, at the same time contain 23.9 at.% oxygen content.