| Summary: | 碩士 === 明志科技大學 === 材料工程系碩士班 === 104 === Optimization design of transparent conductive substrate is an integrated materials technology which is considered multidisciplinary, including anti-reflective coatings, optoelectronic properties of transparent conductive materials, mechanical properties, moisture resistance, and compatibility of post-processing temperature. In this study, we used four-layer anti-reflective coatings to increase the total transmittance of transparent conductive substrates; ITO-SiOx nano-multilayer (NML) structure to create a low-refractive-index material; and ITO-Ag NML structure to obtain a low resistivity (< 1×10-4 Ω-cm) and control the optical extinction coefficient. Furthermore, we employed rotational-sequential-sputtering method to fabricate dense NML films, and enhanced the moisture resistance of films by rapid thermal annealing treatment. Results showed that the average visible transmittance of ITO/Ag/ITO substrate was higher than 90% with a sheet resistance lower than 4.5 Ω/□; the local maximal transmittance of ITO-SiOx-AlN substrate was up to 99%; the local maximal transmittance of ITO/SiOx/AlN flexible substrate was up to 92.3% with a sheet resistance have 404 Ω/□; the average visible transmittance of ITO/Ag/AlN flexible substrate was higher than 88% with a sheet resistance lower than 10.6 Ω/□.
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