The Measurement and Analysis of Reliability and Electrical Characteristics in Boron doped-Zinc Oxide (ZnO:B) Thin Film RRAMs

碩士 === 銘傳大學 === 電子工程學系碩士班 === 103 === In this work, metal-insulator-metal (MIM) capacitors with Boron doped ZnO dielectrics were fabricated and investigated for non-volatile memory application. ZnO:B thin films were prepared by DC sputtering and analysis X-ray photoelectron spectrometer in ZnO:B thi...

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Bibliographic Details
Main Authors: Chih-Chi Chen, 陳誌錡
Other Authors: Fu-Chien Chiu
Format: Others
Language:zh-TW
Published: 2015
Online Access:http://ndltd.ncl.edu.tw/handle/06634689685448245540